发明名称 Non-volatile electrically erasable and programmable semiconductor memory cell utilizing asymmetrical charge trapping
摘要 A method of enhancing erasure of a cell having a non-conductive charge trapping layer, the cell having a gate generally over the charge trapping layer includes programming the cell to minimize the width of a trapping region within the charge trapping layer by reading with a minimum voltage on the gate in a direction opposite that of programming.
申请公布号 US6566699(B2) 申请公布日期 2003.05.20
申请号 US20010939570 申请日期 2001.08.28
申请人 SAIFUN SEMICONDUCTORS LTD. 发明人 EITAN BOAZ
分类号 G11C16/10;G11C16/14;G11C16/26;H01L21/28;H01L29/792;(IPC1-7):H01L31/119 主分类号 G11C16/10
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