发明名称 Method for manufacturing porous structure and method for forming pattern
摘要 A pattern forming material contains a block copolymer or graft copolymer and forms a structure having micro polymer phases, in which, with respect to at least two polymer chains among polymer chains constituting the block copolymer or graft copolymer, the ratio between N/(Nc-No) values of monomer units constituting respective polymer chains is 1.4 or more, where N represents total number of atoms in the monomer unit, Nc represents the number of carbon atoms in the monomer unit, No represents the number of oxygen atoms in the monomer unit.
申请公布号 US6565763(B1) 申请公布日期 2003.05.20
申请号 US20000588721 申请日期 2000.06.07
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 ASAKAWA KOJI;HIRAOKA TOSHIRO;AKASAKA YOSHIHIRO;HOTTA YASUYUKI
分类号 C08J9/26;B82B1/00;B82B3/00;C01B31/02;C04B35/52;C08F297/02;C08F299/00;C08G81/02;C08G83/00;C23F1/00;G11B5/65;G11B5/84;H01J9/02;H01L21/033;H01L21/302;H01L21/3065;H01M2/16;H01M4/58;H01M4/88;H01M4/96;H01M10/40;(IPC1-7):C08J9/26 主分类号 C08J9/26
代理机构 代理人
主权项
地址