| 发明名称 |
Self-aligned contact areas for sidewall image transfer formed conductors |
| 摘要 |
A structure for forming a sidewall image transfer conductor having a contact pad includes forming an insulator to include a recess, depositing a conductor around the insulator, and etching the conductor to form the sidewall image transfer conductor, wherein the conductor remains in the recess and forms the contact pad and the recess is perpendicular to the sidewall image transfer conductor.
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| 申请公布号 |
US6566759(B1) |
申请公布日期 |
2003.05.20 |
| 申请号 |
US19990379453 |
申请日期 |
1999.08.23 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
CONRAD EDWARD W.;LAM CHUNG H.;MARTIN DALE W.;SPROGIS EDMUND |
| 分类号 |
H01L21/60;H01L21/768;H01L23/485;(IPC1-7):H01L23/48 |
主分类号 |
H01L21/60 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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