Method of removing ink from a semiconductor wafer

摘要

A cleaning method to remove ink from the surface of a semiconductor wafer includes securing the wafer to a spin chuck, submerging the spinning wafer into an N-Methyl-Pyrolidone (NMP) solution to dissolve the ink on the surface of the semiconductor wafer, spraying a cleaning solution onto the surface of the spinning wafer to clean the ink off the surface of the wafer, and blowing gas onto the surface of the spinning wafer so as to remove residue from the surface of the wafer.