发明名称 Microscopic defect inspection apparatus and method thereof, as well as positional shift calculation circuit therefor
摘要 An apparatus and/or a method for inspecting fine defects on a substrate having minute patterns formed thereon as a target of inspection by detecting an image thereof with fine pixel size, wherein high speed processing is needed for position alignment over a wide region which is expanded equivalently therewith while obtaining a video processing circuit having a small size, wherein a video signal equal to or less than 0.2 mum in pixel size is obtained by using an optical system of DUV (far-ultraviolet) light or a video detection system of an electron beam. For instance, a search region for detecting position gaps is set at ±4 pixels, while on one substrate are mounted a plurality of video processing circuits, each being constructed with an LSI which can perform processing of k channels, thereby realizing a high-speed video processing portion having a small size.
申请公布号 US6566671(B1) 申请公布日期 2003.05.20
申请号 US20000593955 申请日期 2000.06.15
申请人 HITACHI, LTD. 发明人 YOSHIDA ATSUSHI;MAEDA SHUNJI;OKABE TAKAFUMI;MIZUMOTO HISASHI;ISOBE MITSUNOBU
分类号 G01N21/88;G01N21/94;G01N21/956;G06T1/00;H01L21/66;(IPC1-7):G01V8/00 主分类号 G01N21/88
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