| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas cleaning method for removing the unnecessary deposit on the inner wall, fixture or the like of an apparatus for manufacturing a thin film, a thick film, a powder and a whisker using a CVD method, a sputtering method, a sol-gel method and a vapor deposition method. SOLUTION: Plasmaless cleaning is performed by gas containing at least NOF.
|
