METHOD FOR RETRIEVING ZINC CONTAINED IN THE SOLUTION USED TO CHEMICAL-POLISH ZINC ELECTROPLATING LAYER

摘要

PURPOSE: A method for retrieving zinc contained in the solution used to chemical-polish zinc electroplating layer is provided to improve zinc retrieval rate. CONSTITUTION: The method includes the steps of maintaining the etching solution at 40 deg.C and pH 3; adding (C6H8O7) and (C4H6O4) to the etching solution in an amount of 0.2 to 0.4 g/L·etching solution; electrochemically reacting the etching solution at a current density of 50 A/dm¬2 for 20 min to retrieve zinc.