| 摘要 |
PROBLEM TO BE SOLVED: To control aligners for semiconductor so as to automatically perform optimum exposure according to the distortion generated, depending on various the conditions of each of the aligner for semiconductor, and to efficiently reduce matching errors to the utmost due to distortion factors without increasing process steps. SOLUTION: This controls system, which contains a plurality of aligners for semiconductor 101 and which controls a variety of exposures in manufacturing semiconductor devices, is constituted, such that in performing a plurality of exposures, an optimum exposure condition for each exposure is selected for practice, based on the distortion generated in each aligner for semiconductor 101.
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