| 摘要 |
PROBLEM TO BE SOLVED: To provide a rotating coating apparatus, which can surely prevent generation of turbulent flow inside a vessel. SOLUTION: Within the vessel 2 of the rotating coating apparatus 1, a rotatable support base 4 to support a wafer W and an arm 6 to drop the chemical liquid on the wafer W are installed. Moreover, the rotating coating apparatus 1 is also provided with a gas-leading path 12 for leading the laminar-flow forming gas into the vessel 2. This gas-leading path 12 includes a glass filter, provided at the upper part of the vessel 2. The lamina-flow forming gas is introduced into the vessel 2 via this gas filter 13. In addition, the vessel 2 is also provided with a wall 15, which is formed to spread continuously in the manner of a curve toward the lower part from the edge at the lower end of the glass filter 13. Accordingly, a down-flow of laminar-flow forming gas is generated, in the entire part of the horizontal direction in a region surrounded by the wall 15 located inside the vessel 2.
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