| 发明名称 |
METHOD FOR CLEANING CERAMIC MEMBER FOR USE IN SEMICONDUCTOR PRODUCTION APPARATUS, CLEANING AGENT AND COMBINATION OF CLEANING AGENTS |
| 摘要 |
PURPOSE: To provide a method for cleaning a ceramic member for use in a semiconductor production apparatus, wherein a metal migration from the ceramic member to a semiconductor can significantly be reduced. CONSTITUTION: The ceramic member for use in the semiconductor production apparatus is cleaned with an organic acid or weak acid.
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| 申请公布号 |
KR20030038369(A) |
申请公布日期 |
2003.05.16 |
| 申请号 |
KR20020065144 |
申请日期 |
2002.10.24 |
| 申请人 |
NGK INSULATORS, LTD. |
发明人 |
YAMAGUCHI SHINJI;KIKU TAIJI;KONDOU NOBUYUKI |
| 分类号 |
B08B7/00;B08B3/08;B08B3/12;C11D7/20;C11D7/26;C11D11/00;H01L21/00;H01L21/304;H01L21/683;(IPC1-7):H01L21/304 |
主分类号 |
B08B7/00 |
| 代理机构 |
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