| 摘要 |
PURPOSE: A lithographic apparatus and a device manufacturing method are provided to prevent the deformation of a slider by using a pressure compensation vessel. CONSTITUTION: A passageway(26) is provided through a slider(10) so that the interior of a pressure compensation vessel(20) is in communication with the vacuum space in the region on the second side(24) of the slider(10). When equilibrium is reached, the pressure in the interior of the pressure compensation vessel(20) will be the same as that in the vacuum space and will therefore also be a vacuum. The interior of the pressure compensation vessel(20) is alternatively evacuated by an independent gas evacuation means, without necessarily having the passageway(26). Any contamination present in the pressure compensation vessel(20) due to out-gassing does not reach the very contaminant-sensitive vacuum space on the second side(24) of the slider(10). An upper wall(28) of the pressure compensation vessel transmits the resulting force to sidewalls(30) of the pressure compensation vessel(20). Therefore instead of the pressure being distributed over the whole of the first side(22) of the slider(10), it is concentrated on the slider(10) where it is in contact with the sidewalls(30).
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