发明名称 BLANK HOLDER FOR MANUFACTURE OF EXPOSURE MASK, AND METHOD OF MANUFACTURING EXPOSURE MASK
摘要 <p>PROBLEM TO BE SOLVED: To provide a blank holder which enables the user to process the other side, keeping a pattern already made at one side of a blank for formation of an exposure mask in non-break condition, and a method of manufacturing the exposure mask. SOLUTION: This holder 1 is one, where the blank 100 for manufacture of an exposure mask being constituted by supporting a membrane 102 in the shape of a thin film with a support frame 101, and this is equipped with a body 3 which has a seta 3a, whereon the blank 100 is to be placed. In this seat 3a, a cavity 7 is made at a position which serves as inside of the support frame 101 of the blank 100, in the condition with the blank 100 being placed on the seat 3a. This seat 3a is provided with an exhaust groove 9 which is led to a position outside the blank 100 from the cavity 7.</p>
申请公布号 JP2003142380(A) 申请公布日期 2003.05.16
申请号 JP20010338890 申请日期 2001.11.05
申请人 SONY CORP 发明人 OMORI SHINJI;KOIKE KAORU;MORIYA SHIGERU;IWASE KAZUYA
分类号 G03F1/20;G03F1/22;H01L21/027;(IPC1-7):H01L21/027;G03F1/16 主分类号 G03F1/20
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