PLASMA CHAMBER APPARATUS FOR PLASMA POLYMERIZATION SYSTEM AND METHOD FOR FORMING PLASMA POLYMERIZED MATERIAL USING THE SAME

摘要

PURPOSE: A plasma chamber apparatus by which polymerized material is more uniformly and strongly adhered to the surface of a sample, and a method for forming plasma polymerized material using the plasma chamber apparatus are provided. CONSTITUTION: The plasma chamber apparatus for plasma polymerization system comprises a pretreatment chamber (60) comprising a non reactive gas injection part (62) for supplying non reactive gas having a low activity and electrodes (64) through which a moving sample (40) continuously supplied passes so that organic matter on the surface of the sample is removed; and a polymerization chamber (70) comprising a reactive gas injection part (72) which is connected to the pretreatment chamber to receive the non reactive gas, and into which a reactive gas is supplied and electrodes (74) through which the sample passing through the pretreatment chamber passes so that a polymerized material is adhered onto the surface of the sample by plasma polymerization reaction, wherein the pretreatment chamber is directly connected to the polymerization chamber, and a curtain (67) is installed between the pretreatment chamber and polymerization chamber to pass the sample as preventing back flow of the reactive gas.