发明名称 VACUUM TREATMENT UNIT AND METHOD FOR TREATING OBJECT TO BE TREATED
摘要 <p>PROBLEM TO BE SOLVED: To provide a vacuum treatment unit in which residual charges are not stored on a substrate even if the electrostatic attraction of a substrate is repeated and the substrate can be attracted stably. SOLUTION: The vacuum treatment system 1 comprises first and second treatment chambers 4 and 5 each having an electrostatic chuck 70 capable of attracting a substrate 2 electrostatically and is arranged to perform prescribed treatment while attracting the substrate 2 to an electrostatic attraction chuck 70 electrostatically under vacuum, a carrying chamber 7 provided with a robot 50 capable of carrying the substrate 2 to the first and second treatment chambers 4 and 5 and arranged to be introduced with a prescribed ionization gas and evacuated, and a UV light irradiating unit 60 disposed at such a position in the carrying chamber 7 as the substrate 2 can be irradiated with UV-rays capable of ionizing the ionization gas from the electrostatic attraction side.</p>
申请公布号 JP2003142570(A) 申请公布日期 2003.05.16
申请号 JP20010334399 申请日期 2001.10.31
申请人 ULVAC JAPAN LTD 发明人 MAEHIRA KEN;ICHIHASHI MOTOKO;FUWA KO
分类号 B65G49/00;C23C14/50;C23C16/458;H01L21/68;H01L21/683;(IPC1-7):H01L21/68 主分类号 B65G49/00
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