ELECTRON BEAM EXPOSURE SYSTEM

摘要

PROBLEM TO BE SOLVED: To realize an electron beam exposure system of the proximity exposure system providing high throughput. SOLUTION: The electron beam exposure system of the proximity exposing system comprises a stage 49, an electro-optical column 2 and a vacuum chamber 1. This system is further provided with a preload chamber 11 for delivering and receiving a wafer 100, to and from a wafer cassette 16 and a load chamber 9 which fixes the wafer transferred from the preload chamber 11 to a pallet 41 and then transfers the wafer to the stage 49 in the vacuum chamber and also removes the wafer from the pallet 41 transferred from the stage 49, and then transfers the wafer to the preload chamber 11. The load chamber also switches from atmospheric conditions and vacuum conditions.