发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a technique by which the defective external form of a collectively molded package can be prevented and the product cost of a semiconductor device can be reduced. SOLUTION: A film is formed in the cavity 3 of a first metal mold 2 by providing film sucking pieces 4 on the bottom of the cavity 3 and forcibly sucking the film through film sucking gaps 5 partially provided around the pieces 4.
申请公布号 JP2003142511(A) 申请公布日期 2003.05.16
申请号 JP20010340241 申请日期 2001.11.06
申请人 HITACHI LTD;HITACHI TOKYO ELECTRONICS CO LTD 发明人 KURATOMI BUNJI;SHIMIZU FUKUMI;IMURA KENICHI
分类号 B29C45/26;B29C45/02;B29C45/14;B29L31/34;H01L21/56;(IPC1-7):H01L21/56 主分类号 B29C45/26
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