发明名称 |
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a technique by which the defective external form of a collectively molded package can be prevented and the product cost of a semiconductor device can be reduced. SOLUTION: A film is formed in the cavity 3 of a first metal mold 2 by providing film sucking pieces 4 on the bottom of the cavity 3 and forcibly sucking the film through film sucking gaps 5 partially provided around the pieces 4. |
申请公布号 |
JP2003142511(A) |
申请公布日期 |
2003.05.16 |
申请号 |
JP20010340241 |
申请日期 |
2001.11.06 |
申请人 |
HITACHI LTD;HITACHI TOKYO ELECTRONICS CO LTD |
发明人 |
KURATOMI BUNJI;SHIMIZU FUKUMI;IMURA KENICHI |
分类号 |
B29C45/26;B29C45/02;B29C45/14;B29L31/34;H01L21/56;(IPC1-7):H01L21/56 |
主分类号 |
B29C45/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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