| 摘要 |
PROBLEM TO BE SOLVED: To provide etching resist ink which reduces operation environmental problems and environmental problems such as atmospheric pollution and whose resist has superior performance in curing sensitivity, etching resistance, adhesion, etc. SOLUTION: The etching resist ink is obtained from a photosetting composition obtained by emulsifying a composition, containing acid-group containing resin, a reactive prepolymer, and/or a reactive monomer and a photopolymerization initiator with an emulsifier and characterized in that the ink contains a resoluble surface active agent as the emulsifier and the acid group is substantially not neutralized. |
