发明名称 |
SUBSTRATE FOR ELECTROOPTICAL DEVICE, MANUFACTURING METHOD FOR THE SUBSTRATE, ELECTROOPTICAL DEVICE, MANUFACTURING METHOD FOR THE DEVICE AND ELECTRONIC EQUIPMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a reflective and semitransmissive electrooptical device in which both the brightness of a reflective display and the chromo of a transmissive display are secured. SOLUTION: A optically transmissive layer 212 is formed on a first substrate 211 and a slope surface 212a having a valley in cross section is provided on the layer 212. A reflective layer 213 having an aperture 213h on the slope surface 212a is formed on the optically transmissive layer 212. A color layer 214 is formed on the layer 213. A thickness part 214a is formed on the layer 214 corresponding to the surfaces 212a of the layer 212. |
申请公布号 |
JP2003140568(A) |
申请公布日期 |
2003.05.16 |
申请号 |
JP20020188616 |
申请日期 |
2002.06.27 |
申请人 |
SEIKO EPSON CORP |
发明人 |
TAKIZAWA KEIJI;ODAGIRI YORIHIRO |
分类号 |
G02B5/02;G02B5/08;G02B5/20;G02F1/1335;G09F9/00;G09F9/30;G09F9/35;H01L51/50;H05B33/14 |
主分类号 |
G02B5/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|