发明名称 SUBSTRATE FOR ELECTROOPTICAL DEVICE, MANUFACTURING METHOD FOR THE SUBSTRATE, ELECTROOPTICAL DEVICE, MANUFACTURING METHOD FOR THE DEVICE AND ELECTRONIC EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide a reflective and semitransmissive electrooptical device in which both the brightness of a reflective display and the chromo of a transmissive display are secured. SOLUTION: A optically transmissive layer 212 is formed on a first substrate 211 and a slope surface 212a having a valley in cross section is provided on the layer 212. A reflective layer 213 having an aperture 213h on the slope surface 212a is formed on the optically transmissive layer 212. A color layer 214 is formed on the layer 213. A thickness part 214a is formed on the layer 214 corresponding to the surfaces 212a of the layer 212.
申请公布号 JP2003140568(A) 申请公布日期 2003.05.16
申请号 JP20020188616 申请日期 2002.06.27
申请人 SEIKO EPSON CORP 发明人 TAKIZAWA KEIJI;ODAGIRI YORIHIRO
分类号 G02B5/02;G02B5/08;G02B5/20;G02F1/1335;G09F9/00;G09F9/30;G09F9/35;H01L51/50;H05B33/14 主分类号 G02B5/02
代理机构 代理人
主权项
地址