发明名称 HIGH FREQUENCY POWER SUPPLY
摘要 PROBLEM TO BE SOLVED: To obtain a high frequency power supply for supplying high frequency power to such a load as the impedance may be varied abruptly, e.g. a plasma processing system, in which under power supply to the load is prevented upon abrupt change of load impedance. SOLUTION: The high frequency power supply 1 comprising a DC power supply section 1A and a DC/high frequency AC converting section 1B is provided with a circuit 1C for discharging a smoothing capacitor C at the output end of the DC power supply section 1A forcibly. Furthermore, a means for suppressing output from an inverter INV2 by operating the switch element of the inverter INV2 in an active region upon detection of a transient variation in the impedance of the load 2 in the reducing direction is also provided.
申请公布号 JP2003143861(A) 申请公布日期 2003.05.16
申请号 JP20010335243 申请日期 2001.10.31
申请人 DAIHEN CORP 发明人 KOTANI HIROYUKI;FUKUMOTO YOSHIKI;ITO HIROYUKI
分类号 H02M7/48 主分类号 H02M7/48
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