PHOTOMASK WITH DUSTPROOF DEVICE AND EXPOSURE METHOD USING THE SAME

摘要

PURPOSE: To provide a photomask with a dustproof device which is excellent in UV transmittability of a short wavelength region and light resistance and does not require an operation for replacement with inert gas and an exposure method using the same. CONSTITUTION: The photomask with the dustproof device comprises superposing a transparent substrate permitting the transmission of UV rays on the light shielding film pattern surface side of the photomask and discharging and removing the air between the photomask and the transparent substrate thereby firmly sticking and bonding together the photomask and the transparent substrate. The photomask may also be formed by forming a transparent film permitting the transmission of the UV rays on the light shielding film pattern surface side, then superpositing the transparent film permitting the transmission of the UV rays thereon and bonding together the transparent film and the transparent substrate by discharging and removing the air therebetween.