发明名称 METHOD OF EXPOSING PATTERN AND DEVICE THEREOF, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE AND THE ELECTRONIC DEVICE
摘要 PROBLEM TO BE SOLVED: To solve the problems of a conventional system, such as that each time and expensive mask or reticule, is indispensable when exposing multikind and small- quantity devices and that it is practically impossible to manage them at manufacture or after delivery to the market by affixing specific numbers or manufacture history information to product device made of these masks. SOLUTION: In projective exposure of the information of a two-dimensional light modulator to an exposure substrate, the two-dimensional light modulator an the substrate are scanned, and it is arranged so that the pattern of a projected image moving accompanying the scanning stands still relatively on the exposed substrate moving accompanying the scanning. Furthermore, the exposed substrate is scanned and exposed at a roughly fixed speed, covering the whole region in the scan direction of the exposed substrate by exposure illumination light scanning the top of the two-dimensional light modulator. Hereby, the whole region of the exposed substrate is exposed, without using a mask or a reticule consisting of a conventional fixed pattern. Moreover, numbers, codes, and manufacture conditions are recorded in individual products of the devices manufactured by exposure which uses such a two-dimensional light modulator.
申请公布号 JP2003142379(A) 申请公布日期 2003.05.16
申请号 JP20010338868 申请日期 2001.11.05
申请人 HITACHI LTD 发明人 OSHIDA YOSHITADA;NAKADA TOSHIHIKO;ISADA NAOYA;YAMAGUCHI YOSHIHIDE
分类号 G02F1/13;G03F7/22;H01L21/027;(IPC1-7):H01L21/027 主分类号 G02F1/13
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