| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure method which can properly control the treatment result to a substrate, separately for each substrate, and a device manufacturing method which can improve the quality of a device. SOLUTION: This exposure method, which transfers the pattern of a mask M onto the substrate P, includes a register process for registering the mask M and the substrate P and an addition process for adding the information of the register result in the register process onto the substrate P. The register results can be controlled separately for each substrate by using this information added to the substrate. Moreover, the information added onto the substrate P includes information about accuracy, and the information may be added to the periphery of the pattern region of the substrate P.
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