| 摘要 |
PROBLEM TO BE SOLVED: To provide an annealing device and a manufacturing method of an optical disk capable of preventing the deterioration of mechanical performance of an optical disk substrate even though the annealing treatment is applied on the optical disk substrate at a high temperature. SOLUTION: When an innermost peripheral radius formed at the innermost side of an irregular pattern 111 in the optical disk substrate 11 is expressed as Rp and a radius of a laser beam on the surface of the incident side of laser beam in the optical disk substrate 11 is expressed as Rb, a diameter r of a spacer 12 placing the optical disk substrate 11 thereon is made to be a value smaller than (Rp-Rb) but also as large as possible close to (Rp-Rb). The optical disk substrate 11 is supportable by a placing surface larger than a placing table 122 of the spacer 12, and also the contact between the transmitting part of the laser beam L on the surface of the incident side of the laser beam and the placing table 122 of the spacer 12 is prevented in the optical disk substrate 11. |
