发明名称 |
SEMICONDUCTOR MANUFACTURING SYSTEM, METHOD FOR SUPPLYING HIGH FREQUENCY TO SEMICONDUCTOR MANUFACTURING UNIT AND HIGH FREQUENCY DISTRIBUTOR |
摘要 |
<p>PROBLEM TO BE SOLVED: To remove impurities from an electrostatic chuck without the sacrifice of economy or productivity. SOLUTION: The semiconductor manufacturing system comprises a plurality of semiconductor manufacturing units 10 each comprising an electrostatic chuck 20 for holding a wafer W with a Coulomb's force due to potential difference, and a chamber 30 internally generating an electric field upon application of a voltage from the other system and bringing a prescribed supply gas into a plasma state, and a high frequency distributor 60 for distributing a high frequency for cleaning outputted from a high frequency power supply 101 to the electrostatic chucks 20 of the plurality of semiconductor production units 10.</p> |
申请公布号 |
JP2003142571(A) |
申请公布日期 |
2003.05.16 |
申请号 |
JP20010335811 |
申请日期 |
2001.10.31 |
申请人 |
APPLIED MATERIALS INC |
发明人 |
NOSE NAOMICHI |
分类号 |
H01L21/302;H01L21/203;H01L21/3065;H01L21/68;H01L21/683;(IPC1-7):H01L21/68;H01L21/306 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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