发明名称 SEMICONDUCTOR MANUFACTURING SYSTEM, METHOD FOR SUPPLYING HIGH FREQUENCY TO SEMICONDUCTOR MANUFACTURING UNIT AND HIGH FREQUENCY DISTRIBUTOR
摘要 <p>PROBLEM TO BE SOLVED: To remove impurities from an electrostatic chuck without the sacrifice of economy or productivity. SOLUTION: The semiconductor manufacturing system comprises a plurality of semiconductor manufacturing units 10 each comprising an electrostatic chuck 20 for holding a wafer W with a Coulomb's force due to potential difference, and a chamber 30 internally generating an electric field upon application of a voltage from the other system and bringing a prescribed supply gas into a plasma state, and a high frequency distributor 60 for distributing a high frequency for cleaning outputted from a high frequency power supply 101 to the electrostatic chucks 20 of the plurality of semiconductor production units 10.</p>
申请公布号 JP2003142571(A) 申请公布日期 2003.05.16
申请号 JP20010335811 申请日期 2001.10.31
申请人 APPLIED MATERIALS INC 发明人 NOSE NAOMICHI
分类号 H01L21/302;H01L21/203;H01L21/3065;H01L21/68;H01L21/683;(IPC1-7):H01L21/68;H01L21/306 主分类号 H01L21/302
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