发明名称 |
Pattern forming method and method of fabricating device |
摘要 |
The inventive pattern forming method for transferring a bright line pattern to a photoresist material with a photomask having the bright line pattern includes a step of transferring the bright line pattern of the photomask to the photoresist material by exposure with a light exposure of at least four times and not more than 10 times the light exposure photosensitizing the photoresist material and inverting solubility. Thus, excellent CD-focus characteristics are attained thereby obtaining a pattern forming method and a method of fabricating a device with small dimensional dispersion. |
申请公布号 |
US2003091940(A1) |
申请公布日期 |
2003.05.15 |
申请号 |
US20020127772 |
申请日期 |
2002.04.23 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
NAKAO SHUJI |
分类号 |
G03F1/08;G03F1/14;G03F1/32;G03F1/68;G03F7/00;G03F7/20;G03F7/40;H01L21/027;(IPC1-7):G03F7/00 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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