Method for producing a grid structure, an optical element, an evanescence field sensor plate, microtitre plate and an optical communication engineering coupler as well as a device for monitoring a wavelength

摘要

For producing a coupling grating formed as a line grating with a grating period between 100 nm and 2500 nm, a substrate (1) is covered with a photoresist layer (10) and exposed for instance at the Lithrow angle (THETAL) or at 0° to a mercury-vapour lamp (11) via a folding mirror (13, 13') through a phase mask (14) in the near field of which the photoresist layer is arranged, then structured by reactive ion etching and provided with a transparent layer by reactive DC magnetron sputtering, particularly pulsed DC sputtering or AC-superimposed DC sputtering. The phase mask (14) is structured in advance with the laser two-beam interference method. Since highly precise gratings can be produced even in large dimensions, the process is particularly suited for the production of optical elements, particularly evanescent field sensor plates and optical couplers for communications technology which can be employed in particular as filters for wavelength multiplexing in fibre-optic networks.