| 发明名称 |
GAS FOR PLASMA REACTION, PROCESS FOR PRODUCING THE SAME, AND USE |
| 摘要 |
A gas for plasma reaction which comprises a C5-6 chain perfluoroalkyne, preferably perfluoro-2-pentyne. This gas is suitable for use in the formation of a fine pattern by dry etching, formation of a thin film by CVD, or ashing. It is synthesized by contacting a dihydrofluoroalkane compound or monohydrofluoroalkene compound with a basic compound.
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| 申请公布号 |
WO03041148(A1) |
申请公布日期 |
2003.05.15 |
| 申请号 |
WO2002JP11360 |
申请日期 |
2002.10.31 |
| 申请人 |
ZEON CORPORATION;SUGAWARA, MITSURU;YAMADA, TOSHIRO;SUGIMOTO, TATSUYA;TANAKA, KIMIAKI |
发明人 |
SUGAWARA, MITSURU;YAMADA, TOSHIRO;SUGIMOTO, TATSUYA;TANAKA, KIMIAKI |
| 分类号 |
H01L25/00;C07C17/25;C07C21/22;C23C16/00;H01L21/3065;H01L21/311;(IPC1-7):H01L21/306 |
主分类号 |
H01L25/00 |
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