发明名称 PROCESS FOR FORMING METALLIZED CONTACTS TO PERIPHERY TRANSISTORS
摘要 A process and apparatus directed to forming metal plugs in a peripheral logic circuitry area of a semiconductor device to contact both N+ and P+ doped regions of transistors in the peripheral logic circuitry area. The metal plugs are formed after all high temperature processing used in wafer fabrication is completed. The metal plugs are formed without metal diffusing into the active areas of the substrate. The metal plugs may form an oval slot as seen from a top down view of the semiconductor device.
申请公布号 WO03041127(A2) 申请公布日期 2003.05.15
申请号 WO2002US35425 申请日期 2002.11.06
申请人 MICRON TECHNOLOGY, INC. 发明人 LANE, RICHARD, H.;MCDANIEL, TERRY
分类号 H01L21/3205;H01L21/768;H01L21/8242;H01L23/52;H01L23/522;H01L27/108 主分类号 H01L21/3205
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