发明名称 Schottky barrier diode
摘要 A Schottky barrier diode has a Schottky contact region formed in an n epitaxial layer disposed on a GaAs substrate and an ohmic electrode surrounding the Schottky contact region. The ohmic electrode is disposed directly on an impurity-implanted region formed on the substrate. An insulating region is formed through the n epitaxial layer so that an anode bonding pad is isolated form other elements of the device at a cathode voltage. The planar configuration of this device does not include the conventional polyimide layer, and thus has a better high frequency characteristics than conventional devices.
申请公布号 US2003089959(A1) 申请公布日期 2003.05.15
申请号 US20020205608 申请日期 2002.07.26
申请人 SANYO ELECTRIC COMPANY, LTD. 发明人 ASANO TETSURO;ONADA KATSUAKI;NAKAJIMA YOSHIBUMI;MURAI SHIGEYUKI;TOMINAGA HISAAKI;HIRATA KOICHI;SAKAKIBARA MIKITO;ISHIHARA HIDETOSHI
分类号 H01L21/329;H01L29/47;H01L29/872;(IPC1-7):H01L27/095 主分类号 H01L21/329
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