发明名称 Embedded light shield scheme for micro display backplane fabrication
摘要 A light shield apparatus and formation method for preventing the transmission of incident light towards active devices of the display. In one embodiment, the present invention recites patterning a second metal layer to form a plurality of second metal structures. The present embodiment also recites depositing an intermetal dielectric layer above the plurality of second metal structures. Subsequently, the present embodiment deposits a light absorbing antireflective coating material above the intermetal dielectric layer to form a light shield followed by another planarized IMD layer such that transmission of incident light towards underlying active devices is reduced. The present embodiment also performs the step of forming a plurality of metal pixels above the antireflective coating material wherein adjacent ones of the plurality of metal pixels have a gap region disposed therebetween. As a result, the antireflective coating material of the present embodiment reduces the transmission of incident light through the gap region between the plurality of metal pixels and towards the active devices of the display.
申请公布号 US2003090600(A1) 申请公布日期 2003.05.15
申请号 US20010012289 申请日期 2001.11.13
申请人 CHARTERED SEMICONDUCTORS MANUFACTURED LIMITED 发明人 TEO LENG XAVIER SEAH;SUBRAHMANYAM CHIVUKULA
分类号 G02F1/1368;G02F1/1362;(IPC1-7):G02F1/136 主分类号 G02F1/1368
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