发明名称 Method and apparatus for measuring process errors and method and apparatus for measuring overlay using the same
摘要 In a method and an apparatus for measuring process errors capable of reducing the process errors, and a method and an apparatus for measuring an overlay, at least two regions are assigned on an object to be measured, which has been passed through a predetermined unit process. Process error values of each region are detected. Error correcting values of each region are calculated based on the process error values. The calculated error correcting values are fed back to a device performing the predetermined unit process. The process error values are merged and outputted as one file. The error correcting values of each region formed on the object are reflected in the device performing the unit process, so the process failure generated in each region of the object can be reduced when the unit process is performed.
申请公布号 US2003091914(A1) 申请公布日期 2003.05.15
申请号 US20020278801 申请日期 2002.10.24
申请人 CHO JEONG-HEE 发明人 CHO JEONG-HEE
分类号 G03F7/20;G03F7/24;G06T7/00;H01L21/00;H01L21/027;H01L21/66;(IPC1-7):G03F9/00;G03C5/00;G06K9/00;G01B11/00 主分类号 G03F7/20
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