发明名称 |
METHOD AND APPARATUS FOR THE PREPARATION OF CLEAN GASES |
摘要 |
A method and apparatus for preventing contamination of a substrate or a substrate surface, and particularly relates to prevention of contamination of raw materials, semi-finished products, base materials of products and substrate surface in a high-tech industry such as in the production of semiconductors and liquid crystals. A gas coming into contact with a base material or substrate is purified by dust removing means and adsorption and/or absorption means so that the concentration of fine particles in the gas is below class 1,000 and a non-methane hydrocarbon concentration is below 0.2 ppm. Thereafter, the base material or the substrate surface is exposed to this gas.
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申请公布号 |
US2003089231(A1) |
申请公布日期 |
2003.05.15 |
申请号 |
US19950424545 |
申请日期 |
1995.06.02 |
申请人 |
FUJII TOSHIAKI;SUZUKI TSUKURU;SUZUKI HIDETOMO;SAKAMOTO KAZUHIKO |
发明人 |
FUJII TOSHIAKI;SUZUKI TSUKURU;SUZUKI HIDETOMO;SAKAMOTO KAZUHIKO |
分类号 |
B01D46/00;B01D53/04;B01D53/26;F24F3/16;(IPC1-7):B01D53/02 |
主分类号 |
B01D46/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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