| 发明名称 |
PROCESS FOR CLEANING COMPONENTS USING CLEANING MEDIA |
| 摘要 |
A method for cleaning a semiconductor processing component is provided. The process calls for directing a stream of cleaning media at a surface of the component, the cleaning media including zirconia. After cleaning with the cleaning media, frozen CO2 (dry ice) pellets may be directed at the surface to further clean the component.
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| 申请公布号 |
WO03040433(A1) |
申请公布日期 |
2003.05.15 |
| 申请号 |
WO2002US29496 |
申请日期 |
2002.09.18 |
| 申请人 |
SAINT-GOBAIN CERAMICS AND PLASTICS INC. |
发明人 |
HAERLE, ANDREW, G.;PERRY, EDWARD, A. |
| 分类号 |
B24C1/00;B24C11/00;(IPC1-7):C23G1/00;C23G1/02;B08B7/00;B08B3/00;B08B3/14;B24B1/00;B24C3/00;B24C5/04 |
主分类号 |
B24C1/00 |
| 代理机构 |
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