发明名称 |
Apparatus and methods for collecting global data during a reticle inspection |
摘要 |
Disclosed is a method of inspecting a reticle defining a circuit layer pattern that is used within a corresponding semiconductor process to generate corresponding patterns on a semiconductor wafer. A test image of the reticle is provided, and the test image has a plurality of test characteristic values. A baseline image containing an expected pattern of the test image is also provided. The baseline image has a plurality of baseline characteristic values that correspond to the test characteristic values. The test characteristic values are compared to the baseline characteristic values such that a plurality of difference values are calculated for each pair of test and baseline characteristic values. Statistical information is also collected.
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申请公布号 |
US2003091224(A1) |
申请公布日期 |
2003.05.15 |
申请号 |
US20020314030 |
申请日期 |
2002.12.04 |
申请人 |
KLA-TENCOR TECHNOLOGIES CORPORATION |
发明人 |
WILEY JAMES N.;YE JUN;JUANG SHAUH-TEH;ALLES DAVID S.;LU YEN-WEN;CAO YU |
分类号 |
G03F1/08;G06T1/00;G06T7/00;H01L21/027;(IPC1-7):G06K9/00 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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