| 摘要 |
There is provided an ophthalmic characteristic measuring apparatus in which when a wavefront measurement is carried out, an adjustment of an exposure amount, such as an exposure time or a light amount of a light source, is carried out. A first light source section emits light flux with a first wavelength. A first illumination optical system illuminates a minute area on a retina of a subject eye with the first flux from the first light source. A first light receiving optical system guides a part of light flux reflected and returned from the retina of the subject eye to a first light receiving section through a first conversion member for converting the reflected light flux into at least 17 beams. A second light source section emits light flux with a second wavelength. A second illumination optical system illuminates a predetermined area on the retina of the subject eye with the second light flux from the second light source section. A second light receiving optical system guides the second light flux reflected and returned from the retina of the subject eye to a second light receiving section. An arithmetic section determines an exposure amount of the first light receiving section on the basis of a signal of the second light receiving section.
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