This writing provides a method of fabricating a cathode requiring relatively few and somewhat simple steps. One embodiment provides a method of fabricating a cathode in which the passivation layer and the metallic gate chromium are masked and patterned simultaneously. The method effectuates patterning of the passivation layer as necessary and simultaneously fixed a location for both access spots and inter-pixel electrical isolation areas to chromium constituting the metallic gate. Importantly, the present implementation effectively eliminates a conventionally requisite subsequent metallic gate chromium masking and etching step.
