发明名称 |
AGENT FOR FORMING COATING FOR NARROWING PATTERN AND METHOD FOR FORMING FINE PATTERN USING THE SAME |
摘要 |
An agent for forming a coating for narrowing a pattern which is applied on a substrate having a photoresist pattern and narrows the spacings among respective photoresist patterns by the thermal shrinkage thereof, to thereby form a finer pattern, characterized in that it comprises a water-soluble polymer and a surfactant and a method for forming a fine pattern using the agent for forming the coating. The agent for forming a coating for narrowing a pattern allows the formation of a fine pattern which is excellent in controllability for its pattern dimension, exhibits a good profile, and complies with the requirements for characteristics in a semiconductor device.
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申请公布号 |
WO03040832(A1) |
申请公布日期 |
2003.05.15 |
申请号 |
WO2002JP11498 |
申请日期 |
2002.11.05 |
申请人 |
TOKYO OHKA KOGYO CO., LTD.;SUGETA, YOSHIKI;KANEKO, FUMITAKE;TACHIKAWA, TOSHIKAZU |
发明人 |
SUGETA, YOSHIKI;KANEKO, FUMITAKE;TACHIKAWA, TOSHIKAZU |
分类号 |
G03F7/40;H01L21/027;(IPC1-7):G03F7/40 |
主分类号 |
G03F7/40 |
代理机构 |
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代理人 |
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地址 |
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