| 摘要 |
PURPOSE: Loading/unloading methods for an etching unit are provided to reduce the force applied to lift pins by the surface tension generated between an object and lower electrodes, thereby stably carrying out the loading/unloading for a thin object. CONSTITUTION: A loading method for an etching unit includes the steps of removing an object into an etching chamber by a vacuum robot, lifting lift pins of a lower unit to support at a surface of the object, lifting lower electrodes of the lower unit to support to the surface of the object, and lowering the lower unit and removing the object to an etching position. When unloading the etching unit, the lower unit is lifted(702), and the lower electrodes of the lower unit are lowered to be separated from the object(703). And the object is removed to the outside of the etching chamber by the vacuum robot(704) and the lift pin of the lower unit are lowered(705).
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