发明名称 IMAGE SENSOR AND MANUFACTURING METHOD THEREOF
摘要 PURPOSE: An image sensor and a method for manufacturing the same are provided to be capable of minimizing the thickness difference of color filters without forming a planarization layer. CONSTITUTION: An image sensor comprises a plurality of photodiodes(PD) formed on a substrate(10,11), a passivation layer(PL) and color filters(R,G,B). The passivation layer(PL) has a concave shaped groove formed at a portion corresponding to the photodiodes(PD). The color filters(R,G,B) are filled into the concave shaped groove and planarized to the surface of the passivation layer(PL). The image sensor further includes a mircolens(ML) directly connected to the color filters(R,G,B) without a planarization layer.
申请公布号 KR20030037295(A) 申请公布日期 2003.05.14
申请号 KR20010067780 申请日期 2001.11.01
申请人 HYNIX SEMICONDUCTOR INC. 发明人 LIM, JAE YEONG
分类号 H01L27/146;(IPC1-7):H01L27/146 主分类号 H01L27/146
代理机构 代理人
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