发明名称 |
SULFONYL OXIME COMPOUND, RADIATION-SENSITIVE ACID GENERATOR USING THE SAME, POSITIVE-TYPE RADIATION- SENSITIVE RESIN COMPOSITION, AND NEGATIVE-TYPE RADIATION- SENSITIVE RESIN COMPOSITION |
摘要 |
PROBLEM TO BE SOLVED: To provide a sulfonyl oxime compound useful as an acid generator sensitive to far-ultraviolet radiation or the like, and to provide a radiation- sensitive resin composition using the same. SOLUTION: This sulfonyloxime compound (may be in the form of its dimmer) is shown by general formula (1) [wherein, R<1> is H, an alkyl or the like; R<2> is an alkyl or the like; X is a halogen atom; Y is R<3> , CO-R<3> (R<3> is H or an alkyl) or the like]. The 2nd objective radiation-sensitive acid generator comprises the same. The last objective positive- or negative-type radiation- sensitive resin composition of chemical amplification type contains the acid generator. |
申请公布号 |
JP2003137860(A) |
申请公布日期 |
2003.05.14 |
申请号 |
JP20020237135 |
申请日期 |
2002.08.15 |
申请人 |
JSR CORP |
发明人 |
YONEDA EIJI;TONERI TATSUYA;O ISAMU;SHIMOKAWA TSUTOMU |
分类号 |
G03F7/004;C07C317/28;C07C317/30;C07C317/32;H01L21/027 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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