发明名称 SULFONYL OXIME COMPOUND, RADIATION-SENSITIVE ACID GENERATOR USING THE SAME, POSITIVE-TYPE RADIATION- SENSITIVE RESIN COMPOSITION, AND NEGATIVE-TYPE RADIATION- SENSITIVE RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a sulfonyl oxime compound useful as an acid generator sensitive to far-ultraviolet radiation or the like, and to provide a radiation- sensitive resin composition using the same. SOLUTION: This sulfonyloxime compound (may be in the form of its dimmer) is shown by general formula (1) [wherein, R<1> is H, an alkyl or the like; R<2> is an alkyl or the like; X is a halogen atom; Y is R<3> , CO-R<3> (R<3> is H or an alkyl) or the like]. The 2nd objective radiation-sensitive acid generator comprises the same. The last objective positive- or negative-type radiation- sensitive resin composition of chemical amplification type contains the acid generator.
申请公布号 JP2003137860(A) 申请公布日期 2003.05.14
申请号 JP20020237135 申请日期 2002.08.15
申请人 JSR CORP 发明人 YONEDA EIJI;TONERI TATSUYA;O ISAMU;SHIMOKAWA TSUTOMU
分类号 G03F7/004;C07C317/28;C07C317/30;C07C317/32;H01L21/027 主分类号 G03F7/004
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