| 摘要 |
PROBLEM TO BE SOLVED: To provide a positive photosensitive composition and a resist material having an excellent balance in various performances such as heat resistance, sensitivity, resolution. SOLUTION: The positive photosensitive composition containing (A) a hydroxystyrene polymer having the structural unit expressed by formula (1) and (B) a photosensitive agent which is decomposed by light, is characterized in that the hydroxystyrene polymer (A) has a syndiotactic structure having >=30% tacticity of racemipentad of the C1 carbon in the phenyl group by<13> C-NMR. |
