| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a slurry composition which contains abrasive grains but can be left for a long time with no hard sediment formed or no coagulation of grain brought about. SOLUTION: The cutting or polishing slurry composition comprises an abrasive grain and a carrier component for cutting or polishing a work piece made of a hard and brittle material, wherein the carrier component contains (a) a nonaqueous nonionic polar solvent at a content of from 80 wt.% to 99.5 wt.%, (b) an organic electrolyte adjusted to pH 4.5-8 at that of form 0.05 wt.% to 10 wt.%, and (c) water at that of from 0.5 wt.% to 10 wt.%.</p> |
