WAFER STAGE UNIT OF EXPOSURE EQUIPMENT

摘要

PURPOSE: A wafer stage unit of exposure equipment is provided to be capable of rapidly removing the particles of a table by using a suction member. CONSTITUTION: A wafer is adsorbed on a table(140) by the force of vacuum. An X-axis stage(130) is installed at the lower portion of the table(140) for moving the table(140) to the X-axis direction. A pair of Y-axis stage(120) are installed at both ends of the X-axis stage(130) for moving the table(140) accompanied with the X-axis stage(130) to the Y-axis direction. A suction member(160) is located at the upper portion of the table(140) for rapidly removing the particles of the table(140). The suction member(160) includes a cleaning disc panel(162) having a plurality of suction holes for inhaling the particles, and a vacuum line(164) connected with the cleaning disc panel(162).