发明名称 LIGHT DIFFUSING SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME
摘要 <p>PROBLEM TO BE SOLVED: To provide a light diffusing substrate which does not decrease the diffusing performance even when various kinds of apparatuses having different sizes of minimum display pixels are manufactured. SOLUTION: The diffusing substrate is manufactured by applying a photosensitive resin on a transparent substrate for a liquid crystal display panel, exposing the photosensitive resin through an exposure mask and developing the resin to from a diffusing layer having a diffusing pattern composed of minute recesses and projections. In the above method, the mask pattern of the exposure mask is manufactured by repeatedly drawing a basic pattern BP in a specified size by a beam drawing machine while forming a blank BL of 1 to 5μm width in the boundary part between adjacent basic patterns.</p>
申请公布号 JP2003139921(A) 申请公布日期 2003.05.14
申请号 JP20010334991 申请日期 2001.10.31
申请人 ASAHI GLASS CO LTD;OPTREX CORP 发明人 OZEKI MASAO;TAKASAKI ICHIRO
分类号 G02B5/02;G02B5/08;G02F1/13357;G03F1/76;G03F1/78;G03F7/20;(IPC1-7):G02B5/02;G03F1/08;G02F1/133 主分类号 G02B5/02
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