发明名称 MICROMACHINE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a micromachine with excellent yield and precision by improving adhesiveness of a sacrificial layer. SOLUTION: When manufacturing the micromachine provided with fine structure by using a sacrificial layer 91, prior to formation of the sacrificial layer 91, a thin film of a structure body 51 to be overlapped by the sacrificial layer 91 or a thin adhesive layer 61 with high adhesiveness to a substrate having a material different from or same as that of the sacrificial layer 91 is thinly formed by spattering, thereby improving the adhesiveness of the sacrificial layer 91. Thus, handling is easy during manufacturing process. There is no need to roughen a surface of the structure body for improving the adhesiveness to the sacrificial layer 91, so that the micromachine with high precision can be mass-produced with an excellent yield.
申请公布号 JP2003136499(A) 申请公布日期 2003.05.14
申请号 JP20010339734 申请日期 2001.11.05
申请人 SEIKO EPSON CORP 发明人 YAMAZAKI TETSURO
分类号 G02B26/02;B81C1/00;H01L21/302;H01L21/306;(IPC1-7):B81C1/00 主分类号 G02B26/02
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