SUBSTRATE HOUSING CONTAINER

摘要

PROBLEM TO BE SOLVED: To provide a substrate housing container which can prevent the influence of nitrogen-containing compound released from a container and, therefore, can prevent the influence thereof to a resist pattern without using adsorbent for chemical substance which requires excessive cost when a photomask blanks substrate or photomask substrate having chemically amplified resist film is kept by using a substrate housing container. SOLUTION: This container for housing photomask blanks substrate or photomask substrate having chemically amplified resist film comprises polymer material. It is a feature of this substrate housing container that the sum quantity of the nitrogen-containing compound which is adsorbed and captured by the purge and trap method and is detected by GC-MS in outgas components which are released when the polymer material is heated on the condition of 120 deg.C and 15 min. is <=1 ppm in terms of toluene.