| 摘要 |
Disclosed herein is a manufacturing method for a semiconductor device, including heat treatment by light irradiation to a substrate having a base semiconductor and a semiconductor layer formed on the base semiconductor, the semiconductor layer being different in kind from the base semiconductor, wherein the temperature of the substrate is once maintained at an intermediate temperature between a starting temperature and an attainable maximum temperature, or the temperature rise rate from the starting temperature to the intermediate temperature is set smaller than that from the intermediate temperature to the attainable maximum temperature. Accordingly, in the lamp annealing after heteroepitaxial growth, the generation of dislocations in the heteroepitaxial layer can be reduced.
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