发明名称 Method and apparatus for illuminating a surface using a projection imaging apparatus
摘要 A method and illumination optical system forms a modified illumination configuration on an optical integrator so that a secondary light source having a desired modified illumination configuration is formed and light loss is minimized. A light beam shape changing element that diffuses illumination in a plurality of directions, and an angular light beam forming element that forms a plurality of light source images operate together to create a modified illumination configuration on the optical integrator. Since the secondary light source has a desired modified illumination configuration, an aperture stop used to restrict the size and/or shape of the secondary light source blocks only a small amount of illumination, or can be eliminated altogether. It is possible to alter the annular ratio and outer diameter of an annular or quadrupole modified illumination configuration by changing the magnification of a zoom optical system positioned between the light beam shape changing element and the angular light beam forming element. Furthermore, by changing the focal length of a zoom optical system (which is positioned upstream of the optical integrator), it is possible to change the outer diameter of the annular or quadrupole secondary light source without changing the annular ratio thereof.
申请公布号 US6563567(B1) 申请公布日期 2003.05.13
申请号 US20000540874 申请日期 2000.03.31
申请人 NIKON CORPORATION 发明人 KOMATSUDA HIDEKI;TANITSU OSAMU;GOTO AKIHIKO;KANAYAMAYA NOBUMICHI;SHIBUYA MASATO;TAKAHASHI TETSUO
分类号 G03F7/20;(IPC1-7):G03B27/72;G03B27/42;G03B27/54 主分类号 G03F7/20
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