发明名称 LIQUID CHEMICAL SUPPLY SYSTEM
摘要 PROBLEM TO BE SOLVED: To control minute flow of a liquid chemical by utilizing a nozzle sucking the liquid chemical by evacuation from a liquid chemical tank and spraying it, in a liquid chemical supply system. SOLUTION: The liquid chemical supply system is provided with the liquid chemical tank 10 housing the liquid chemical 5 inside and capable of being tightly closed, the nozzle 11 connected to the liquid chemical tank through a liquid chemical supply pipe 7 and sucking the liquid chemical supplied from the liquid chemical tank by evacuation and spraying the liquid chemical by sending a high pressure gas from outside, an air sucking means 12 connected to the upper surface of the liquid chemical tank and sucking air in the inside space S to generate negative pressure, and a positive pressure supply means 13 for supplying a positive pressure gas having an optional pressure to the negative pressure space formed in the liquid chemical tank. The supply flow rate of the liquid chemical to the nozzle is controlled by controlling the pressure of the negative pressure gas supplied to the liquid chemical tank by the positive pressure supply means. As a result, a minute flow rate of the liquid chemical to be supplied is controlled by using the nozzle sucking the liquid chemical from the liquid chemical tank by evacuating and spraying.
申请公布号 JP2003135999(A) 申请公布日期 2003.05.13
申请号 JP20010334421 申请日期 2001.10.31
申请人 FUJIMORI GIJUTSU KENKYUSHO:KK;NCS:KK 发明人 HAMADA HIROKI;MATO HIDETOSHI
分类号 B05B7/30;B05B1/00;B05C11/10;H01L21/304;(IPC1-7):B05B7/30 主分类号 B05B7/30
代理机构 代理人
主权项
地址