Coating liquid for forming a silica-containing film with a low-dielectric constant and substrate coated with such a film

摘要

A coating liquid for forming a silica-based film having a low dielectric constant, as low as 3 or less, comprising (i) silica-based fine particles having phenyl groups and (ii) a polysiloxazane which can be produced by reacting hydrolyzate of an alkoxysilane represented by the formula (XnSi(OR1)4-n)and/or hydrolyzate of a halogenated silane represented by the formula (XnSiX'4-n) with a polysilazane represented by -(SiR2R4-NR3)-m, or a coating-liquid for forming the silica-based film, comprising (i) silica-based fine particles having phenyl groups and (ii') an oxidatively decomposable resin with the weight ratio of the particles to the resin being in the range of 0.5 to 5.